机读格式显示(MARC)

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• 001 0000247097

• 020 __ |a |c ￥2.30

• 041 0_ |a eng

• 093 __ |a O461.2 |v 4

• 245 1_ |a Glew Discharge Processes;Sputtering and Plasma Etching. |c Chapman,Brian. |g |A GLEWDISC,SPUTTERI |F CHAPMAN,BRIAN

• 250 __ |a

• 260 __ |a N.Y. |b Wiley |c 1980

• 300 __ |a 406c

• 440 0_ |a

• 700 _0 |a Chapman,Brian. |A CHAPMAN,BRIAN |4 著

• 851 _0 |a CN |b HIEL

• 905 __ |a HIEL |d O461.2/C1

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